Dynamic layer rearrangement during growth of layered oxide films by molecular beam epitaxy by J. H. Lee, G. Luo, I. C. Tung, S. H. Chang, Z. Luo, M. Malshe, M. Gadre, A. Bhattacharya, S. M. Nakhmanson, J. A. Eastman, H. Hong, J. Jellinek, D. Morgan, D. D. Fong, and J. W. Freeland, Nature Materials, doi:10.1038/nmat4039 (2014).

There is also an accompanying article at the UConn MSE department site.

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